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Figure 6
Cu samples electrodeposited under different conditions. (a) Chronocoulometric profiles of in situ grown Cu materials, deposited continuously (blue) and including intermittent potential application, labelled `deposition with pauses' (red). (b) Soft XAS (sXAS) at the Cu L3 edge in TFY mode and (c) hard XAS (hXAS) at the Cu K edge in PFY mode (centred at the Cu Lα emission line) of the two Cu materials. For comparison, the spectrum of the Pt WE prior to electroplating under OCP conditions with a 0.1 M CuSO4 electrolyte is depicted as a dashed grey line. The vertical dashed lines show the energies related to the Cu(I) and Cu(II) oxides and CuSO4.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 3| May 2025| Pages 634-648
https://doi.org/10.1107/S160057752500116X
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