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Figure 7
Spectromicrograph of copper electrodeposited during 1 min under very reductive conditions obtained with a Cu L3-edge resonant excitation energy of 933.0 eV. The right half of the sample was recorded in TFY mode and the left half was collected in Cu Lα PFY mode. The dashed line marks the shape of the 1000 µm × 500 µm SiN membrane within the Si frame.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 3| May 2025|
https://doi.org/10.1107/S160057752500116X
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