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Figure 1
Process flow for lamellar gratings: nanoimprinting (a), resist pattern after demolding (b) and residual layer etch (c), Cr deposition (d), hard mask after lift-off (e), and the final grating after groove etching and mask removal (f). The colors depict Si (gray), quartz (light blue), resist (pink) and Cr (blue).

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 5| September 2025| Pages 1194-1200
https://doi.org/10.1107/S1600577525005946
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