Fabrication and characterization of a full-size ultra-precise lamellar grating for the Cosmic beamline at ALS-U

Voronov, D.; Park, S.; Huang, L.; Islegen-Wojdyla, A.; Gullikson, E.; Padmore, H.; Wang, T.; Idir, M.

doi:10.1107/S1600577525005946

Journal of Synchrotron Radiation Journal of
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Figure 3
AFM images of the resist pattern after nanoimprint lithography (a) and the final Si grating #1 (b) and grating #2 (c) after RCA etch and mask removal.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 32| Part 5| September 2025| Pages 1194-1200

https://doi.org/10.1107/S1600577525005946

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