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Figure 2
Background characterization. (a) Example diffraction pattern from a Pd42.5Cu30Ni7.5P20 metallic glass sample, roughly 20 µm thick, mounted on a Mettler–Toledo UFH1 chip. (b) Background diffraction pattern taken at another position on the chip away from the sample, plotted with the same color map. (c) Azimuthally integrated scattering intensity profiles for the sample (red) and background (blue), in units of photons per second per unit solid angle. The dashed black line shows the intensity profile with the chamber in air and without the sample assembly including the WCu pinhole mask (see text). Dashed and dotted vertical lines indicate the positions of Bragg reflections of W and Au, respectively, that are visible in the intensity profiles.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 5| September 2025| Pages 1228-1234
https://doi.org/10.1107/S1600577525005594
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