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Figure 3
Illustration of the transverse separation process for two microbunches using TDCs. (a) At TDC1, the microbunches, due to their longitudinal separation, receive equal but opposite transverse kicks, maximizing their separation while maintaining control over transverse oscillations. (b) After a 90° betatron phase advance, the microbunches achieve their maximum transverse separation, which is ideal for insertion device placement to generate dual X-ray pulses with both longitudinal and transverse separation. (c) After another 90° phase advance, the microbunches reach TDC2. (d) At TDC2, opposite transverse kicks are applied, returning the microbunches to the center of the transverse phase space, ensuring no impact on other beamline operations.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 6| November 2025| Pages 1380-1389
https://doi.org/10.1107/S1600577525007374
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