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Figure 4
(a) Scheme of the combined NAPXPS endstation, which consists of the fast-entry load-lock, the UFO chamber, preparation chambers and the analysis chamber with the laser heating and (b) the top view photograph of the NAPXPS endstation. (c) The configuration of the sample stage (laser heating from back) and electron analyzer during the ambient-pressure measurement with the inset showing the HIPP-2 electron analyzer integrated in the analysis chamber. (d) The high-pressure preparation chamber with gas up to 20 bar and the sample heated to 800°C. (e) The gas mixture system for the setup of the solid–gas environment, where five gas lines are introduced and controlled by the automatic control system.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 33| Part 2| March 2026| Pages 523-530
https://doi.org/10.1107/S1600577525011506
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