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Figure 5
(a) Simulated and (b) experimental temperature field of the wafer, using the same colorbar scaling. The orange and blue lines are the reference vertical and horizontal lines. The simulated temperature field represents the entire wafer, including the region embedded in the sample holder, whereas the measurement captures only the area outside the holder. (c) Induced Joule heating. (d) Quantitative comparison of simulation and measurements across the vertical (orange) and horizontal (blue) lines. The positions of the Berkovich indentations are indicated by black dots.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 33| Part 4| July 2026|
https://doi.org/10.1107/S1600577526004728
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