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Figure 1
Optical layout of the beamline. Distances from the undulator (U) are indicated in metres. IS: incident slit; C1 and C2: DCM crystals. The multilayer mirrors (M1 and M2) were used as a reference together with a low-energy-cut filter (F) to suppress the total reflection from the mirrors. The DCM and DMM were operated alternately. |

journal menu![[Figure 1]](tol5022fig1.jpg)
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