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Figure 2
Experimental setups for beam characterization. (a) Total flux measurement using a silicon PIN photodiode placed downstream of the exit window (W). (b) Beam imaging using a beam-image monitor (IM). (c) θ–2θ scan using a Si(111) analyzer crystal to evaluate the wavelength–angle distribution. (d) Flux density measurement using the exit slit (ES) and a downstream clean-up slit (CS). |

journal menu![[Figure 2]](tol5022fig2.jpg)
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