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Figure 1
Schematic layout of the Aramis Alvra beamline. The X-ray optics consists of a set of offset mirrors, a double-crystal monochromator (DCM) and a pair of focusing (KB) mirrors. The XFEL beam trajectory is defined by multiple aperture sets positioned along the beamline. The beam profile and size can be monitored at several locations using PPRMs based on Ce:YAG scintillators. The incident X-ray flux is controlled using solid-state diamond and silicon attenuators. Single-shot XFEL pulse position and intensity are measured non-destructively in the accelerator tunnel using a gas-based ionization monitor and at various points along the beamline using photon beam position sensors (PBPSs) relying on X-ray back-scattering from thin solid targets. Reduced repetition rates or user-defined XFEL pulse sequences can be selected using a pulse picker. |

journal menu![[Figure 1]](xl5038fig1.jpg)
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