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Figure 9
(a) The Weibull distribution, where the proportion of defects = (k/ λ)(x/ λ)(k−1) exp[−(x/ λ)k] with parameters λ = 1 and k = 2. The basic curve is produced with x ranging from 0.001 to 3 µm, which is then scaled by (the mean defect size)/(proportion of defects) to give (a). This is used as the prior distribution for the dimension of the regions with varying orientations within an imperfect crystal. A Gaussian distribution is used as the prior distribution for the orientation of these regions. (b) and (c) show examples of the changes in the intensity profiles along Ω and Xbanana, perfect (red) and when defects are introduced (blue) for a 3 µm crystal, at a diffraction peak of 2θ = 30°. The distribution of distance between defects is given in (a) with an orientation FWHM of 0.58° (σ = 0.25°).

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