Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length

Lee, S.Y.; Cho, I.H.; Kim, J.M.; Kang, H.C.; Noh, D.Y.

doi:10.1107/S0909049510044535

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 4
(a) SEM image of the sectioned multilayer mask with about 690 nm period. The white regions are opaque WSi₂ layers and the dark regions are transparent Si layers. (b) Schematic illustration of the hard X-ray proximity lithography set-up using the focused beam.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 18| Part 2| March 2011| Pages 143-147

https://doi.org/10.1107/S0909049510044535

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