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Figure 4
Measured intensity of the [(1\,\,\bar1\,\,\bar2)] reflection of the RUB thin film (upper curve) and of the [(0\,\,\bar1\,\,1)] reflection of the TEN substrate (lower curve) as a function of the azimuthal orientation of the sample (φ). The RUB plot has been shifted to the left by 36° in order to show the correspondence between RUB and TEN reflections. The two (*) and (+) symbols indicate reflections from differently orientated crystals.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 19| Part 5| July 2012| Pages 682-687
doi:10.1107/S0909049512027562
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