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Figure 4
(a) Co lines obtained by nanoimprint with a periodicity of ∼300 nm. (b) Detail in SEM showing the defects in the nanoimprint process. The contrast occurs between alternate Co lines (bright lines) and clean Si substrate regions (dark lines); (c) and (d) Raw CCD images as recorded under an applied magnetic field of +2 T, at 772.1 eV using circular right (σ+) and circular left (σ−) helicities, respectively: 1, specular and diffraction orders arising from the regular grating; 2, half-order contributions coming from the double period. Images, recorded with a 3 s exposure time, are shown on a log scale to optimize the rendering. Only about a quarter of the entire field of view of the camera is shown.

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