Two-dimensional resonant magnetic soft X-ray scattering set-up for extreme sample environment

Stanescu, S.; Mocuta, C.; Merlet, F.; Barbier, A.

doi:10.1107/S0909049512041325

Figure 4
(a) Co lines obtained by nanoimprint with a periodicity of

300 nm. (b) Detail in SEM showing the defects in the nanoimprint process. The contrast occurs between alternate Co lines (bright lines) and clean Si substrate regions (dark lines); (c) and (d) Raw CCD images as recorded under an applied magnetic field of +2 T, at 772.1 eV using circular right ( [sigma]

+) and circular left ( [sigma]

-) helicities, respectively: 1, specular and diffraction orders arising from the regular grating; 2, half-order contributions coming from the double period. Images, recorded with a 3 s exposure time, are shown on a log scale to optimize the rendering. Only about a quarter of the entire field of view of the camera is shown.