The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF

Xue, C.; Meng, X.; Wu, Y.; Wang, Y.; Wang, L.; Yang, S.; Zhao, J.; Tai, R.

doi:10.1107/S1600577518012833

The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF

C. Xue, X. Meng, Y. Wu, Y. Wang, L. Wang, S. Yang, J. Zhao and R. Tai

A new spatially coherent beamline has been designed and constructed at the Shanghai Synchrotron Radiation Facility. Here, the design of the beamline is introduced and the spatial coherence is analyzed throughout the whole process by wave optics. The simulation results show good spatial coherence at the endstation and have been proven by experiment results.

Keywords: synchrotron radiation; soft X-ray interference lithography beamline; spatial coherence; wave optics; mutual optical intensity.

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The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF

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