Figure 6
Azimuthal alignment scans for crystals with r = 50 mm and substrate nominal radius RP = 1000 mm. Crystal wafer material, reflection and experimentally determined best radius used for the azimuthal alignment are given. The azimuthal alignments were always performed at a Bragg angle of 75° and, in order to enhance the elastic contribution, at a horizontal scattering angle of 130° (crystal n = 0). Elastic peaks are shown for four different azimuthal orientations at 45° intervals (a1, a2, a3, a4). Left: Si(440) crystal at position n = 0. Right: Ge(620) crystal at position n = −2. |