A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source

Hong, Z.; Diao, Q.; Xu, W.; Yuan, Q.; Yang, J.; Li, Z.; Jiang, Y.; Zhang, C.; Zhang, D.; Liu, F.; Zhang, X.; Liu, P.; Tao, Y.; Sheng, W.; Li, M.; Zhao, Y.

doi:10.1107/S1600577522011122

Journal of Synchrotron Radiation Journal of
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Figure 1
(a) Photograph of the MC-CMP system, showing (I) the computer and driver, (II) the gantry guide rail and rotating mechanism of the driving magnet, and (III) the vessel system. (b) Details of the vessel system. (c) Small polishing magnet. Major components are numbered: (1) large magnet and its motion mechanics including rotation and X/Y/Z rectilinear motion; (2) pad which can be inserted into the vessel; (3) channel-cut crystal that can be mounted on the pad (2); (4) small polishing tool; (5) vessel filled with slurry or polishing solution; (6) mini magnet; (7) covering layer; additional material can be added on the mini magnet when different processes are carried out.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 30| Part 1| January 2023| Pages 84-89

https://doi.org/10.1107/S1600577522011122

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