A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source

Hong, Z.; Diao, Q.; Xu, W.; Yuan, Q.; Yang, J.; Li, Z.; Jiang, Y.; Zhang, C.; Zhang, D.; Liu, F.; Zhang, X.; Liu, P.; Tao, Y.; Sheng, W.; Li, M.; Zhao, Y.

doi:10.1107/S1600577522011122

Journal of Synchrotron Radiation Journal of
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Figure 3
Schematic view of the experimental setup for (a) rocking-curve and reflectivity measurements at BL09B (SSRF) and 1B3B (BSRF) (opening size of slit: 5 mm horizontal, 1 mm vertical) and (b) X-ray topography measurements at 4W1A (BSRF) (opening size of slit: 5 mm horizontal, 5 mm vertical).

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 30| Part 1| January 2023| Pages 84-89

https://doi.org/10.1107/S1600577522011122

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