A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source

Hong, Z.; Diao, Q.; Xu, W.; Yuan, Q.; Yang, J.; Li, Z.; Jiang, Y.; Zhang, C.; Zhang, D.; Liu, F.; Zhang, X.; Liu, P.; Tao, Y.; Sheng, W.; Li, M.; Zhao, Y.

doi:10.1107/S1600577522011122

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Figure 4
(a) Optical micrograph of the WCE CC. (b) The corresponding roughness is 873.9 nm r.m.s. in a 417.19 µm × 417.19 µm area. (c) Optical micrograph of the MC-CMP CC. (d) The roughness is 0.614 nm RMS in a 417.19 µm × 417.19 µm area.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 30| Part 1| January 2023| Pages 84-89

https://doi.org/10.1107/S1600577522011122

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