A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source

Hong, Z.; Diao, Q.; Xu, W.; Yuan, Q.; Yang, J.; Li, Z.; Jiang, Y.; Zhang, C.; Zhang, D.; Liu, F.; Zhang, X.; Liu, P.; Tao, Y.; Sheng, W.; Li, M.; Zhao, Y.

doi:10.1107/S1600577522011122

Journal of Synchrotron Radiation Journal of
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Figure 7
Cross-section HRTEM image of the polishing CC workpiece. A three-tiered structure is displayed: the bottom is made of Pt deposition, the middle is an SiO₂ layer, and the top is crystalline matrix.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 30| Part 1| January 2023| Pages 84-89

https://doi.org/10.1107/S1600577522011122

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