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Figure 2
Diffraction pattern of the same area of the larger-than-loop raster with increasing beam intensity. For all diffraction patterns the sample was exposed for 5 ms, with an oscillation of 0.05° at 13.5 keV. From left to right: the sample was exposed to 0.5%, 1%, 5% and 25% of the full beam intensity at AMX, which was 4.35 × 1012 photons s−1 at the time of these experiments.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 31| Part 4| July 2024| Pages 647-654
https://doi.org/10.1107/S160057752400359X
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