Figure 12
Results of the 2D-IBF process on a 95 mm × 20 mm clear aperture within a trapezoidal Si mirror. (a) Initial measured height of the mirror over a 95 mm × 20 mm clear aperture, showing low-frequency height errors of several hundred nm amplitude. (b) The measured height after one iteration of IBF using a 5 mm beam. The PV and r.m.s. height errors are both significantly reduced. (c) The measured height after a second iteration of IBF with a 5 mm beam, showing further reduction in the r.m.s. height error. (d) The measured height after the third and final iteration of IBF, using a 1 mm beam. The r.m.s. height errors converge to below 1 nm, showing excellent performance of the figuring. The high residual PV is due to isolated spikes on the surface, which represent pits or scratches that were present on the surface before the IBF process. |