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Figure 1
XES setup within the UHV chamber, where the sample is placed at a 45° angle relative to the incident beam and the WDS, including the entrance slit, the grating and the CCD placed 90° to the incident beam.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 1| January 2025| Pages 171-179
https://doi.org/10.1107/S1600577524010683
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