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Figure 3
(a) RIXS image of the patterned NanoTerasu logo collected at the Ni L3 edge. The dashed line indicates horizontal position (X = 80 µm) where the scatter plot (b) was obtained. Inset: design of the Ni pattern fabricated on the substrate. (b) Scatter plot of detected X-ray photons at X = 80 µm as a function of photon energy and vertical position Mathematical equation. The RIXS colormap in (a) was constructed by integrating the photon counts within the gray-shaded loss-energy window.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 33| Part 3| May 2026| Pages 739-745
https://doi.org/10.1107/S1600577526000573
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