|
|
|
Figure 1
Schematic optical layout of the KLS ID10 Hard X-ray Nanoprobe beamline (source to sample, 150 m). The IVU24 in-vacuum undulator produces X-rays at 5–25 keV. Two grazing-incidence mirrors (M1, M2) provide harmonic rejection and vertical/horizontal focusing. A Si(111) double-crystal monochromator (DCM) selects the photon energy with ΔE/E ≃ 1.3 × 10−4. The secondary source aperture (SSA) at 58 m defines the virtual source for Kirkpatrick–Baez (KB) nano-focusing mirrors, which deliver a ∼50 nm focused beam at the sample position. Source parameters and component positions are listed in Tables S7 and S8, respectively. |

journal menu![[Figure 1]](ok5168fig1.jpg)
access


