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Figure 3
Scanning electron micrographs of an OSA fabricated out of a 100 m-thick SiC substrate when the PFIB process is realized from the frontside (a) and from the backside (b) of the device. The images are taken during the process from the frontside and after the process from the backside, respectively.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 33| Part 5| September 2026|
https://doi.org/10.1107/S1600577526007113
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